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Ion implanter Product List and Ranking from 4 Manufacturers, Suppliers and Companies

Ion implanter Product List

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Plasma Ion Injection Device "PUPION Series"

Minimize radioactive contamination! Capable of proposing plasma excitation technology tailored to specific applications.

The "PUPION series" is a plasma ion implantation device. It is used for shallow depth doping in nanoelectronics and photonics, as well as for medical-grade radioactive isotopes in beta radiation therapy. It minimizes radioactive contamination during the injection of radioactive isotopes and allows for the proposal of plasma excitation technologies tailored to specific applications. 【Features】 ■ Shallow depth doping in nanoelectronics and photonics, and beta radiation therapy ■ Medical-grade radioactive isotopes ■ Minimizes radioactive contamination during the injection of radioactive isotopes ■ Capable of proposing plasma excitation technologies according to application needs *For more details, please refer to the PDF document or feel free to contact us.

  • Ion implantation equipment

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【Q&A】Frequently Asked Questions about Ion Implantation and Analysis

We introduce frequently asked questions about ion implantation and analysis in a Q&A format.

The Ion Tech Center provides ion implantation services for advanced materials. In the materials, we present frequently asked questions about ion implantation and analysis in a Q&A format. We answer various questions, starting with "What is ion implantation?" as well as "What is amorphous?" and "How is the confidentiality of information regarding samples maintained?" among others. 【Content (excerpt)】 ■Q. What is ion implantation? ■Q. Please tell me about the size and types of samples and wafers that can undergo ion implantation. ■Q. Can I confirm the ion implantation in person? ■Q. What is amorphous? ■Q. How is the confidentiality of information regarding samples maintained? *For more details, please refer to the PDF document or feel free to contact us.

  • Wafer
  • Ion implantation equipment
  • Other contract services

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Circuit formation: Ion implantation

Changing the electrical characteristics of the exposed surface! Introducing the formation of semiconductor circuits.

We would like to introduce "ion implantation" in our semiconductor circuit formation. "Ion implantation" is used multiple times during chip manufacturing to form semiconductor devices. During ion implantation, the wafer is impacted by a beam of charged ions called dopants, which changes the electrical characteristics of the exposed surface. 【Features】 ■ Used multiple times during chip manufacturing to form semiconductor devices ■ Changes the electrical characteristics of the exposed surface *For more details, please refer to the related links or feel free to contact us.

  • Other semiconductors

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Powder ion implantation device

Innovative surface treatment of powders by IonPOWDER. Surface modification is performed on powders through ion implantation.

Features - Various gases can be used (Ar, He, N2, O2, SiH4, mixed gases) - The device can operate with recipes - PVD (physical vapor deposition) mechanism can also be added. Advantages of the process Low-temperature surface treatment: Original material properties are maintained. No coating required: Ions are injected deep, so the surface does not peel off. Respects the shape of the parts: No additional processing is needed. Precise and localized surface treatment: Process optimization is possible. Sample electrical conductivity: Not a concern. Insulating materials can also be treated. Environment: As it is a dry process, there is no chemical waste. Effects of ion implantation Steel: Surface hardening (4 times for stainless steel), excellent wear resistance. Stainless Steel 316L: Friction coefficient reduced by half, pitching resistance improved tenfold. Aluminum: Surface hardening (7 times), significant reduction in friction coefficient, high corrosion resistance. Copper and copper alloys: Strong resistance to oxidation and wear, surface hardening (4 times). Gold: Surface hardening (7 times), increased density, significant reduction in porosity of electroplated layers.

  • Automotive Connectors
  • aluminum
  • Plasma surface treatment equipment

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Aeon Tech Center Co., Ltd. Company Profile

Connecting ion implantation, film formation, and analysis technologies and equipment to innovations in various fields.

Aeon Tech Center Co., Ltd. was established as a professional group that meets the demands of the times, inheriting the business of its predecessor, the Aeon Engineering Research Institute. We conduct cutting-edge research and development, particularly focusing on technologies and equipment related to ion implantation, film formation, and analysis, aiming to become a representative creative laboratory in Japan. 【Business Activities】 ■ Contract research and development related to ion engineering ■ Processing of surface treatments for metals, ceramics, semiconductor materials, etc., using ion engineering equipment ■ Physical analysis and evaluation service business ■ Technical information provision service business ■ Support and mediation for industrial property rights such as research results and patents, utility model rights, design rights, trademark rights, etc., at universities and research institutions ■ Planning, development, manufacturing, sales of precision instruments such as measuring devices and analyzers, as well as contract work related to technical guidance and research ■ Planning, development, manufacturing, sales of electronic components and automatic control devices, as well as contract work related to technical guidance and research ■ Management consulting services *For more details, please refer to the external link or feel free to contact us.

  • Contract manufacturing
  • Processing Contract
  • Other semiconductors

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Fundamental Knowledge of Semiconductors That You Can't Ask Now - Ion Implantation - *Illustrated Explanation*

We will explain the series of processes involved in ion implantation, which is crucial for determining the characteristics of semiconductors, using illustrations.

This document introduces the basics of ion implantation, including its purpose, equipment, and evaluation, through illustrations. Ion Tech Center Co., Ltd. offers contract services for the front-end processes of semiconductors, from sample production for research and development to mass production outsourcing. If you are having trouble with ion implantation, please feel free to leave it to us. [Contents] ■Basic knowledge of ion implantation

  • Semiconductor inspection/test equipment
  • Other semiconductors
  • Other contract services

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Implanter line-up

Various implanter line-up for your various requests

We can perform ion implantation processing under various conditions according to customer requirements, with a wide variety of samples from chips to 12-inch wafers. The implantation conditions range from 10 to 8,000 KeV, from room temperature to high-temperature heating (600 ° C), and about 60 types of ionic species can be handled.

  • Prototype Services
  • Other semiconductors
  • EMS

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Lineup of ion implantation devices

We have a variety of injection devices ranging from low energy up to 8 MeV.

We take pride in our top-level technology and equipment for ion implantation at room temperature, as well as high-temperature ion implantation, which only a few companies in the world can handle. Our company can perform implantation processing under various conditions tailored to customer requests, ranging from chip fragments to 300 mm (12-inch) diameter wafers. Implantation conditions can range from 10 to 8,000 KeV, from room temperature to high-temperature heating (600°C), and we can accommodate approximately 60 types of ion species.

  • Prototype Services
  • Other semiconductors
  • EMS

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